Optical Lithography: Here is Why

Optical Lithography: Here is Why

Burn J. Lin
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This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get a primer on the outlook of optical lithography and the many next-generation technologies that may greatly enhance semiconductor manufacturing in the near future.Topics include:Exposure SystemsImage FormationThe Meter of LithographyComponents in Optical LithographyProcessing and OptimizationImmersion LithographyOutlook for optical lithography
Kategori:
Tahun:
2010
Penerbit:
SPIE Publications
Bahasa:
english
Halaman:
473
ISBN 13:
9780819475602
Fail:
PDF, 30.85 MB
IPFS:
CID , CID Blake2b
english, 2010
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